ASML announces the launch of high NA lithography machines suitable for manufacturing 2nm chips, Intel has purchased 6 units

According to news on December 19, SamMobile reported that ASML will launch chip manufacturing equipment for the 2nm process node in the next few months, which will increase the optical numerical aperture (NA) performance from 0.33 to 0.55. Samsung plans to start producing 2nm chips at the end of 2025

According to reports, Dutch semiconductor equipment manufacturer ASML is said to plan to have a production capacity of only 10 units next year. However, Intel has already pre-ordered 6 of them. Nonetheless, ASML plans to increase the production capacity of this equipment to 20 units per year in the next few years

Currently, the EUV light listed on ASML’s official website There are two engraving machines, namely NXE:3600D and NXE:3400C. Both lithography machines are equipped with 0.33 NA reflective projection optics and 13.5nm EUV light source, which are suitable for the manufacturing of 3/5nm and 5/7nm chips respectively

According to an ASML spokesperson, EXE:5200 is ASML’s next-generation high NA system, with higher lithography resolution and the ability to shrink chips to 1.7 ratio, and increase the density to 2.9 times

##▲ASML High NA System RoadmapAccording to previous reports, ASML It plans to start mass production of the first 0.55 NA EUV lithography machine after 2025 and deliver the first batch to Intel

According to an Intel spokesperson, the company will become the first purchaser of ASML's EXE:5200 . Compared with EXE:5000, EXE:5200 is expected to bring some improvements, such as higher productivity, etc.

According to the prediction of Gartner analyst Alan Priestley, the price of 0.55 NA EUV lithography machine will double to reach US$300 million (approximately 2.142 billion yuan)

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