Lithography machine manufacturer ASML announced that the first new EUV lithography machine Twinscan NXE:3800E has been successfully installed. This new model will bring higher production efficiency. According to news on March 13, ASML has made this important progress.
In addition to the Twinscan EXE series of High-NA EUV lithography machines under development, ASML is also continuously updating and upgrading its NXE series of traditional numerical aperture EUV lithography machines. The future goal is to launch NXE:4000F in 2025 model
.The last two generations of NXE series models, 3400C and 3600D, are suitable for 7~5 and 5~3 nm node production respectively. German media ComputerBase therefore predicts3800E is expected to support the cutting-edge 3~2 nm process
.According to the 2021 version of the roadmap previously shared by ASML, Twinscan NXE:3800E system will further improve alignment accuracy (Overlay) and production capacity compared to the previous generation 3600D
, and can achieve 195 wafers The hourly throughput of the circle has increased significantly by nearly 22% compared to the 160 pieces of the 3600D, and is expected to reach the target of 220 pieces (corresponding to a 37.5% increase).
▲ 2021 version of ASML lithography machine roadmap. Image source ASML, the same belowThe above is the detailed content of ASML's first new EUV lithography machine Twinscan NXE:3800E completed installation. For more information, please follow other related articles on the PHP Chinese website!
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