How many nanometers is Kirin 9010?

The Kirin 9010 uses a 5-nanometer process. After using this process, the transistor density is increased by 30% and the power consumption is reduced, thereby achieving higher performance and longer battery life.

The process of Kirin 9010: 5 nanometers

Kirin 9010 is a product developed by Huawei HiSilicon Semiconductor Co., Ltd. A high-end mobile processor. Its process uses 5-nanometer technology, which is one of the most advanced processes in the field of chip manufacturing.

Compared with the previous generation 7nm process, the 5nm process has significantly improved transistor density, power consumption and performance. Transistor density refers to the number of transistors per unit area, and the number of transistors directly affects the performance of the processor. Power consumption is an indicator of the energy consumption level of the processor. The lower the power consumption, the more energy-saving the processor is.

The Kirin 9010 processor, which uses a 5-nanometer process, has a 30% increase in transistor density compared to the previous generation, which means it can integrate more transistors in a smaller chip area, thereby achieving more High performance. At the same time, the 5-nanometer process also reduces the power consumption of the processor, allowing the Kirin 9010 to have longer battery life while ensuring high performance.

In addition, the Kirin 9010 processor also adopts a variety of advanced technologies, such as heterogeneous multi-core architecture, DaVinci architecture NPU, GPU Turbo technology, etc., to further improve its performance and energy efficiency.

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